Decontamination Process Using CF4-O2 Microwave Discharge Plasma at Atmospheric Pressure

Publication Information

Title

Japanese:	大気圧CF4-02マイクロ波プラズマを用いた除染プロセス
English:	Decontamination Process Using CF4-O2 Microwave Discharge Plasma at Atmospheric Pressure

Author

Japanese:	H.F. Windarto, T. Matsumoto, H. Akatsuka, M. Suzuki.
English:	H.F. Windarto, T. Matsumoto, H. Akatsuka, M. Suzuki.

Language

English

Journal/Book name

Japanese:	日本原子力学会英文誌
English:	J. Nucl. Sci. Technol.

Volume, Number, Page

Vol. 37 No. 9 pp. 787

Published date

2000

Publisher

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Conference name

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Conference site

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