Hot electron interference by 40nm-pitch double slit buried in semiconductor

Publication Information

Title

Japanese:
English:	Hot electron interference by 40nm-pitch double slit buried in semiconductor

Author

Japanese:	H.Hongo, Y.Miyamoto, M.Suhara, K.Furuya.
English:	H.Hongo, Y.Miyamoto, M.Suhara, K.Furuya.

Language

English

Journal/Book name

Japanese:
English:	Microelectronic Engineering

Volume, Number, Page

Vol. 35 pp. 337

Published date

1997

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: