Fabrication of Polycrystalline Silicon Films from SiF4/H2/SiH4 Mixture Gases Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition with In Situ Plasma Diagnostics and Their Structural Properties

Publication Information

Title

Japanese:
English:	Fabrication of Polycrystalline Silicon Films from SiF₄/H₂/SiH₄ Mixture Gases Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition with In Situ Plasma Diagnostics and Their Structural Properties

Author

Japanese:	K. Nakahata, K.Ro, A.Suemasu, T. Kamiya, C.M.Fortmann, I. Shimizu.
English:	K. Nakahata, K.Ro, A.Suemasu, T. Kamiya, C.M.Fortmann, I. Shimizu.

Language

English

Journal/Book name

Japanese:
English:	Jpn. J. Appl. Phys.

Volume, Number, Page

Vol. 39 pp. 3294

Published date

2000

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: