OXIDE MEDIATED EPITAXIAL GROWTH OF CoSi┣D22┫D2 IN A SINGLE DEPOSITION STEP | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	OXIDE MEDIATED EPITAXIAL GROWTH OF CoSi┣D22┫D2 IN A SINGLE DEPOSITION STEP

Author

Japanese:	S. Ohmi, R. T. Tung.
English:	S. Ohmi, R. T. Tung.

Language

English

Journal/Book name

Japanese:
English:	Mat. Res. Soc. Symp. Proc.

Volume, Number, Page

Vol. 564 pp. 117-122

Published date

1999

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

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