Improved Thermal Stability of Ultra-thin CoSi┣D22┫D2 layers by Oxygen Annealing | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	Improved Thermal Stability of Ultra-thin CoSi┣D22┫D2 layers by Oxygen Annealing

Author

Japanese:	大見俊一郎.
English:	SHUN-ICHIRO OHMI.

Language

English

Journal/Book name

Japanese:
English:	Mat. Res. Soc. Symp. Proc.

Volume, Number, Page

Vol. 514 pp. 157-162

Published date

1998

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

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