New Processes of Syuthesizlug Co Fevvites Films at Low Substvate Tempevature by Facing Targets Sputtering | Science Tokyo Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	New Processes of Syuthesizlug Co Fevvites Films at Low Substvate Tempevature by Facing Targets Sputtering

Author

Japanese:	中川茂樹.
English:	SHIGEKI NAKAGAWA.

Language

English

Journal/Book name

Japanese:
English:	Proc. of IUMRS-ICA-94

Volume, Number, Page

pp. 671

Published date

1995

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

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