Ion Beam Deposition Method Using Facing Targets Sputtering Ion Source As a New Reactive Deposition Method

Publication Information

Title

Japanese:
English:	Ion Beam Deposition Method Using Facing Targets Sputtering Ion Source As a New Reactive Deposition Method

Author

Japanese:	中川茂樹.
English:	SHIGEKI NAKAGAWA.

Language

English

Journal/Book name

Japanese:
English:	Proc. of 4┣D1th┫D1 International Symposium on Sputtering and Plasma Processing(ISSP'97)

Volume, Number, Page

pp. 411-420

Published date

1997

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: