Analysis of Stray Magnetic Field at The Substrate and Effect of Applying External Magnetic Field in Facing Targets Sputtering

Publication Information

Title

Japanese:
English:	Analysis of Stray Magnetic Field at The Substrate and Effect of Applying External Magnetic Field in Facing Targets Sputtering

Author

Japanese:	中川茂樹.
English:	SHIGEKI NAKAGAWA.

Language

English

Journal/Book name

Japanese:
English:	Proc. of 4┣D1th┫D1 International Symposium on Sputtering and Plasma Processing(ISSP'97)

Volume, Number, Page

pp. 251-256

Published date

1997

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: