Enhanced short-channel effects of sub-50nm gate length MOSFETs with high-k gate insulator films

Publication Information

Title

Japanese:
English:	Enhanced short-channel effects of sub-50nm gate length MOSFETs with high-k gate insulator films

Author

Japanese:	R.Fujimura, M.Takeda, K.Sato, S.Ohmi, H.Ishiwara, H.Iwai.
English:	R.Fujimura, M.Takeda, K.Sato, S.Ohmi, H.Ishiwara, H.Iwai.

Language

English

Journal/Book name

Japanese:
English:	The 199th Meeting of The Electrochemical Society ULSI Process Integration II

Volume, Number, Page

Vol. 2001-2 pp. 313-323

Published date

2001

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: