Theoretical Modeling and Optimization of LPP EUV Light Source

Publication Information

Title

Japanese:
English:	Theoretical Modeling and Optimization of LPP EUV Light Source

Author

Japanese:	西原功修, 藤間一美, 古河裕之, K.Gamada, T.Kagawa, Y-G.Kang, T.Kato, 河村徹, 小池文博, R.More, H. Maehara, M.Murakami, 西川亘, A.Sasaki, A.Sunahara, H.Tanuma, V.Zhakhovskii, 藤岡慎介, 西村博明, 島田義則, S.Uchida, N.Miyanaga, Y.Izawa.
English:	Katsunobu Nishihara, Kazumi Fujima, Hiroyuki Furukawa, K.Gamada, T.Kagawa, Y-G.Kang, T.Kato, Tohru Kawamura, Fumihiro Koike, R.More, H. Maehara, M.Murakami, Takeshi Nishikawa, A.Sasaki, A.Sunahara, H.Tanuma, V.Zhakhovskii, Shinsuke Fujioka, Hiroaki Nishimura, Yoshinori Shimada, S.Uchida, N.Miyanaga, Y.Izawa.

Language

English

Journal/Book name

Japanese:
English:	4th International Extreme UltraViolet Lithography (EUVL) Symposium, San Diego, California, USA, 07-09 November, 2005.

Volume, Number, Page

Vol. http://www.sematech.org/

Published date

Nov. 2005

Publisher

Japanese:
English:

Conference name

Japanese:
English:	3rd International Extreme UltraViolet Lithography Symposium, Miyazaki, Japan, 1-4 November, 2004.

Conference site

Japanese:
English:	San Diego, California, USA, 07-09 November, 2005.