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Publication Information
Title
Japanese:
English:
Emissivity and Opacity of Xe and Sn Based on a Detailed Atomic Model
Author
Japanese:
A.Sasaki, K.Nishihara, A.Sunahara, K.Gamada, T.Nishikawa, K.Fujima,
T.Kawamura
, F.Koike, T.Kagawa, R.More, T.Kato.
English:
A.Sasaki, K.Nishihara, A.Sunahara, K.Gamada, T.Nishikawa, K.Fujima,
T.Kawamura
, F.Koike, T.Kagawa, R.More, T.Kato.
Language
English
Journal/Book name
Japanese:
English:
3rd International Extreme UltraViolet Lithography Symposium, Miyazaki, Japan, 1-4 November, 2004.
Volume, Number, Page
Vol. http://www.sematech.org/
Published date
Nov. 2004
Publisher
Japanese:
English:
Conference name
Japanese:
English:
3rd International Extreme UltraViolet Lithography Symposium, Miyazaki, Japan, 1-4 November, 2004.
Conference site
Japanese:
English:
Miyazaki, Japan, 1-4 November, 2004.
©2007
Tokyo Institute of Technology All rights reserved.