Development of a Gas Jet-Type Z-pinch Plasma Light Source for EUV Lithography

Publication Information

Title

Japanese:	ガスジェットＺピンチプラズマを用いた半導体リソグラフィ用光源の開発
English:	Development of a Gas Jet-Type Z-pinch Plasma Light Source for EUV Lithography

Author

Japanese:	作地修, 飯塚直哉, 姜飛, 渡邊正人, 河村徹, 沖野晃俊, 堀岡一彦, 堀田栄喜.
English:	Sakuchi Osamu, Iizuka Naoya, Jiang Fei, Watanabe Masato, Kawamura Tohru, Okino Akitoshi, Horioka Kazuhiko, Hotta Eiki.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Jan. 2008

Publisher

Japanese:
English:

Conference name

Japanese:	第25回プラズマプロセシング研究会
English:	The 25th Symposium on Plasma Processing (SPP-25)

Conference site

Japanese:	山口市
English:	Yamaguchi, Japan