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Title
Japanese:半導体用高速熱処理用ゾーンコントロール誘導加熱装置 
English:A Zone-Control Induction Heating (ZCIH) System for Semiconductor Processing 
Author
Japanese: 藤田英明, 尾崎一博, 内田直喜.  
English: Hideaki Fujita, Kazuhiro Ozaki, Naoki Uchida.  
Language Japanese 
Journal/Book name
Japanese:電気学会論文誌D 
English:IEEJ Trans. IA 
Volume, Number, Page vol. 128    no. 3    pp. 296-302
Published date Mar. 2008 
Publisher
Japanese:電気学会 
English:Institute of Electrical Engineering in Japan 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
Abstract This paper proposes a new induction heating technology capable of controlling a precise exothermic distribution, which is named as “zone-control induction heating (ZCIH).” The ZCIH system consists of two or more sets of a high-frequency inverter unit and a work coil. The inverter units control the phase angle of the coil current to be in phase with each other. The ZCIH has capability of operation with the mutual inductance, and enables to locate the coils as close as possible. As a result, the ZCIH technology makes it possible to achieve rapid heating performance with extremely precise exothermic distribution. This paper presents experimental results of a 150-kW six-zone ZCIH system for semiconductor heat processing.

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