Mechanism of Selective Etching of SiGe Layers in SiGe/Si Systems

Publication Information

Title

Japanese:
English:	Mechanism of Selective Etching of SiGe Layers in SiGe/Si Systems

Author

Japanese:	J. Kato, H. Oka, K. Kanemoto, H. Hisamatsu, Y. Matsuzawa, Y. Kitano, T. Hara, M. Hoshina, 大見俊一郎.
English:	J. Kato, H. Oka, K. Kanemoto, H. Hisamatsu, Y. Matsuzawa, Y. Kitano, T. Hara, M. Hoshina, S. Ohmi.

Language

English

Journal/Book name

Japanese:
English:	ECS Transactions

Volume, Number, Page

Vol. 6 No. 8 pp. 245-251

Published date

Aug. 2007

Publisher

Japanese:
English:	The Electrochemical Society

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI