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Title
Japanese:高誘電率HfOxNy絶縁膜のPDAプロセスの検討 
English: 
Author
Japanese: 仲野雄介, 大見俊一郎.  
English: Yusuke Nakano, Shun-ichiro OHMI.  
Language Japanese 
Journal/Book name
Japanese:第68回応用物理学会学術講演会 講演予稿集 
English: 
Volume, Number, Page     No. 2    p. 812
Published date Sept. 2007 
Publisher
Japanese:応用物理学会 
English: 
Conference name
Japanese:第68回応用物理学会学術講演会 
English: 
Conference site
Japanese:北海道大学 
English: 

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