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Publication Information
Title
Japanese:
高誘電率HfOxNy絶縁膜のPDAプロセスの検討
English:
Author
Japanese:
仲野雄介
,
大見俊一郎
.
English:
Yusuke Nakano
,
Shun-ichiro OHMI
.
Language
Japanese
Journal/Book name
Japanese:
第68回応用物理学会学術講演会 講演予稿集
English:
Volume, Number, Page
No. 2 p. 812
Published date
Sept. 2007
Publisher
Japanese:
応用物理学会
English:
Conference name
Japanese:
第68回応用物理学会学術講演会
English:
Conference site
Japanese:
北海道大学
English:
©2007
Tokyo Institute of Technology All rights reserved.