Development of Xe and Sn Discharge Produced Plasma Light Source for EUV Lithography

Publication Information

Title

Japanese:
English:	Development of Xe and Sn Discharge Produced Plasma Light Source for EUV Lithography

Author

Japanese:	渡邊正人, 岸望, Jiang Fei, 沖野晃俊, Bong-Seong Kim, Kwang-Cheol Ko, 堀岡一彦, 堀田栄喜.
English:	Masato Watanabe, Nozomu Kishi, Jiang Fei, Akitoshi Okino, Bong-Seong Kim, Kwang-Cheol Ko, Kazuhiko Horioka, Eiki Hotta.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

pp. SO-P01

Published date

Oct. 2007

Publisher

Japanese:
English:	SEMATECH

Conference name

Japanese:
English:	2007 International EUVL Symposium

Conference site

Japanese:
English:	Sapporo, Japan