Fabrication of III-V-O-I (III-V on Insulator) structures on Si using micro-channel epitaxy with a two-step growth technique

Publication Information

Title

Japanese:
English:	Fabrication of III-V-O-I (III-V on Insulator) structures on Si using micro-channel epitaxy with a two-step growth technique

Author

Japanese:	M. Shichijo, 中根了昌, 菅原聡, S. Takagi.
English:	M. Shichijo, R. Nakane, S. Sugahara, S. Takagi.

Language

English

Journal/Book name

Japanese:
English:	Jpn. J. Appl. Phys.

Volume, Number, Page

Vol. 46 No. 9A, pp. 5930–5934

Published date

Sept. 2007

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: