Evaluation of Si Wire Waveguide Fabricated by Parallel Plate RIE Process using Double Layered EB Resist Containing C60

Publication Information

Title

Japanese:	フラーレン含有の二層構造の電子線レジストを用い、平行平板型反応性イオンエッチングで作製したシリコン細線導波路の評価
English:	Evaluation of Si Wire Waveguide Fabricated by Parallel Plate RIE Process using Double Layered EB Resist Containing C60

Author

Japanese:	井上敬太, 西山伸彦, 榎本晴基, 田村茂雄, 丸山武男, 荒井滋久.
English:	Keita Inoue, Nobuhiko Nishiyama, Haruki Enomoto, Shigeo tamura, Takeo Maruyama, Shigehisa Arai.

Language

English

Journal/Book name

Japanese:
English:	Digest of iNOW2008

Volume, Number, Page

No. 3-P24

Published date

Aug. 2008

Publisher

Japanese:
English:

Conference name

Japanese:
English:	iNOW 2008

Conference site

Japanese:
English:	Yamanashi, Japan