Loss Reduction of SiWireWaveguide on SOI Substrate Prepared by Parallel Plate RIE using Double Layered Resist Mask with C60

Publication Information

Title

Japanese:
English:	Loss Reduction of SiWireWaveguide on SOI Substrate Prepared by Parallel Plate RIE using Double Layered Resist Mask with C60

Author

Japanese:	井上敬太, Dhanorm Plumuwongrot, 西山伸彦, 阪本真一, 榎本晴基, 田村茂雄, 丸山武男, 荒井滋久.
English:	Keita Inoue, Dhanorm Plumuwongrot, Nobuhiko Nishiyama, Shinichi Sakamoto, Haruki Enomoto, Shigeo Tamura, Takeo Maruyama, Shigehisa Arai.

Language

English

Journal/Book name

Japanese:
English:	IEEE NMDC2008

Volume, Number, Page

Published date

Oct. 2008

Publisher

Japanese:
English:

Conference name

Japanese:
English:	The IEEE Nanotechnology Materials and Devices Conference 2008

Conference site

Japanese:
English:	Kyoto University, Kyoto, Japan

Official URL