EB露光により作製したエミッタ幅200nmのInP/InGaAs SHBT

Publication Information

Title

Japanese:	EB露光により作製したエミッタ幅200nmのInP/InGaAs SHBT
English:	InP/InGaAs SHBTs with 200nm wide emitter fabricated by EB lithography

Author

Japanese:	高橋新之助, 山下浩明, 小林嵩, 磯谷優治, 鈴木裕之, 宮本恭幸, 古屋一仁.
English:	Shinnosuke Takahashi, Hiroaki Yamashita, Takashi Kobayashi, Yuji Isogai, Hiroyuki Suzuki, YASUYUKI MIYAMOTO, KAZUHITO FURUYA.

Language

Japanese

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Sept. 2008

Publisher

Japanese:
English:

Conference name

Japanese:	2008年秋季第69回応用物理会学術講演会
English:	The 69th Autumn Meeting, 2008; The Japan Society of Applied Physics

Conference site

Japanese:	愛知県春日井市
English:	Aichi, Japan