Growth of atomically flat ultra-thin Ag films on Si surfaces | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	Growth of atomically flat ultra-thin Ag films on Si surfaces

Author

Japanese:	平山博之.
English:	HIROYUKI HIRAYAMA.

Language

English

Journal/Book name

Japanese:
English:	Surface Science

Volume, Number, Page

vol. 603 pp. 1492-1497

Published date

May 2009

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI

https://doi.org/10.1016/j.susc.2008.09.057

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