Evaluation and Control of Residual Stress in Epitaxial Fluorite-Type-Oxide Thin Films Deposited on Si Substrates by PLD

Publication Information

Title

Japanese:
English:	Evaluation and Control of Residual Stress in Epitaxial Fluorite-Type-Oxide Thin Films Deposited on Si Substrates by PLD

Author

Japanese:	村上晃浩, 高鉉龍, 脇谷尚樹, 木口賢紀, JEFFREYSCOTT.CROSS, 櫻井修, 篠崎和夫.
English:	A. Murakami, H.-Y. Go, N. Wakiya, T. Kiguchi, Jeffrey Cross, O. Sakurai, K. Shinozaki.

Language

English

Journal/Book name

Japanese:
English:	The 3rd International Conference on Science and Technology for Advanced Ceramics (STAC3).

Volume, Number, Page

No. 16pP045

Published date

June 2009

Publisher

Japanese:
English:

Conference name

Japanese:
English:	The 3rd International Conference on Science and Technology for Advanced Ceramics (STAC3).

Conference site

Japanese:
English:	Yokohama, Kanagawa, Japan