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Home > Help Publication Information Title Japanese:   English: Fundamental Study of Low-Temperature Epitaxy of Si and SiGe by Photo-Assisted Chemical Vapor Deposition  Author Japanese: 山田明.   English: AKIRA YAMADA.   Type Type: Thesis (Ph.D.)  Country:   Language   Organization name Tokyo Institute of Technology  Report number   Conferred date 1989/--/--  Judge

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