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Title
Japanese: 
English:The Effect of Chemical Etching by HF Solution on the Photocatalytic Activity of Visible Light-responsive TiO2 Thin Films for Solar Water Splitting 
Author
Japanese: 北野政明, 飯屋谷 和志, 辻丸 光一郎, 松岡雅也, 竹内雅人, 植嶌陸男, John Thomas, 安保正一.  
English: Masaaki Kitano, Kazushi Iyatani, Koichiro Tsujimaru, Masaya Matsuoka, Masato Takeuchi, Michio Ueshima, John Thomas, Masakazu Anpo.  
Language English 
Journal/Book name
Japanese: 
English: 
Volume, Number, Page Vol. 49        pp. 24–31
Published date May 2008 
Publisher
Japanese: 
English:Springer 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
DOI https://doi.org/10.1007/s11244-008-9064-5
Abstract The effect of chemical etching by HF solutionon the photoelectrochemical performance and photocatalyticactivity of visible light-responsive TiO2 (Vis-TiO2)thin films prepared by a radio-frequency magnetron sputteringmethod has been investigated. It was found that Vis-TiO2 thin films treated with HF solution (HF-Vis-TiO2)exhibit a remarkable enhancement of the photoelectrochemicalperformance not only under UV but also visiblelight irradiation as compared to untreated Vis-TiO2. Theincident photon to current conversion efficiencies reached66 and 9.4% under UV (k = 360 nm) and visible light(k = 420 nm), respectively. The HF-Vis-TiO2 thin filmshave a larger surface area and higher donor density thanVis-TiO2, indicating that the remarkable increase in thephotocurrent may be due to the short diffusion length ofthe photoformed holes in reaching the solid–liquid interfaceas well as to the high conductivity. Moreover, theHF-Vis-TiO2 thin films were found to act as efficientphotocatalysts for the decomposition of water with theseparate evolution of H2 and O2 from H2O under visible orsunlight irradiation.

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