Japanese
Home
Search
Horizontal Search
Publication Search
( Advanced Search )
Patent Search
( Advanced Search )
Research Highlight Search
( Advanced Search )
Researcher Search
Search by Organization
Support
FAQ
T2R2 User Registration
Doctoral thesis registration
Support/Contact
About T2R2
What's T2R2?
Operation Guidance
Leaflets
About file disclosure
Related Links
Tokyo Tech
STAR Search
NII IR Program
Home
>
Help
Publication Information
Title
Japanese:
Al2O3ゲート絶縁膜を用いたInP/InGaAsコンポジットチャネルMOSFET
English:
InP/InGaAs composite channel MOSFET with Al2O3 gate dielectric
Author
Japanese:
金澤徹
,
若林和也
,
齋藤尚史
,
寺尾良輔
,
田島智宣
,
池田俊介
,
宮本恭幸
,
古屋一仁
.
English:
Toru Kanazawa
,
kazuya wakabayashi
,
Hisashi Saito
,
Ryousuke Terao
,
Tomonori Tajima
,
Shunsuke Ikeda
,
YASUYUKI MIYAMOTO
,
KAZUHITO FURUYA
.
Language
Japanese
Journal/Book name
Japanese:
電子情報通信学会技術研究報告 電子デバイス
English:
IEICE Technical Report, Electron Devices
Volume, Number, Page
Vol. 109 No. 360 pp. 39-42
Published date
Jan. 2010
Publisher
Japanese:
English:
Conference name
Japanese:
電子情報通信学会 電子デバイス研究会
English:
IEICE Technical Report, Electron Devices
Conference site
Japanese:
東京
English:
Tokyo, Japan
©2007
Tokyo Institute of Technology All rights reserved.