Low temperature deposited Zr-B film applicable to extremely thin barrier for copper interconnect

Publication Information

Title

Japanese:
English:	Low temperature deposited Zr-B film applicable to extremely thin barrier for copper interconnect

Author

Japanese:	Mayumi B. Takeyama, Atsushi Noya, Yasuo Nakadai, Shozo Kambara, Masanobu Hatanaka, Yuichiro Hayasaka, Eiji Aoyagi, Hideaki Machida, 益一哉.
English:	Mayumi B. Takeyama, Atsushi Noya, Yasuo Nakadai, Shozo Kambara, Masanobu Hatanaka, Yuichiro Hayasaka, Eiji Aoyagi, Hideaki Machida, Kazuya Masu.

Language

English

Journal/Book name

Japanese:
English:	Applied Surface Science

Volume, Number, Page

Vol. 256 pp. 1222-1226

Published date

June 2009

Publisher

Japanese:
English:	Elsevier

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI