Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:	MOCVD法による磁性および誘電性セラミックス薄膜の合成と性質に関する研究
English:

Author

Japanese:	舟窪浩.
English:	HIROSHI FUNAKUBO.

Type

Type:	Thesis (Ph.D.)
Country:	Japan

Language

Japanese

Organization name

Tokyo Institute of Technology

Report number

乙第2435号

Conferred date

1993/02/28

Judge

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