Effects of Aspect Ratio of Photoresist Patterns on Adhesive Strength between Microsized SU-8 Columns and Silicon Substrate under Bend Loading Condition

Publication Information

Title

Japanese:
English:	Effects of Aspect Ratio of Photoresist Patterns on Adhesive Strength between Microsized SU-8 Columns and Silicon Substrate under Bend Loading Condition

Author

Japanese:	石山千恵美, 柴田曉伸, 曽根正人, 肥後矢吉.
English:	CHIEMI ISHIYAMA, Akinobu Shibata, Masato Sone, Yakichi Higo.

Language

English

Journal/Book name

Japanese:
English:	Japanese Journal of Applied Physics,

Volume, Number, Page

Vol. 49 pp. 06GN14-1-06GN14-5

Published date

Oct. 2010

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: