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Publication Information
Title
Japanese:
English:
Direct Contact of High-k/Si Gate Stack for EOT below 0.7 nm using LaCe-silicate Layer with Vfb controllability
Author
Japanese:
角嶋邦之
,
小柳友常
,
来山大祐
,
幸田みゆき
,
宋在烈
,
川那子高暢
,
M. Mamatrishat
,
舘喜一
,
M. K. Bera
,
パールハットアヘメト
,
野平博司
,
筒井一生
,
西山彰
,
杉井信之
,
名取研二
,
服部健雄
,
山田啓作
,
岩井洋
.
English:
Kuniyuki KAKUSHIMA
,
Tomotsune Koyanagi
,
来山大祐
,
Miyuki Kouda
,
Jaeyeol Song
,
Takamasa Kawanago
,
M. Mamatrishat
,
Kiichi Tachi
,
M. K. Bera
,
Ahmet Parhat
,
Hiroshi Nohira
,
KAZUO TSUTSUI
,
西山彰
,
Nobuyuki Sugii
,
KENJI NATORI
,
takeo hattori
,
Keisaku Yamada
,
HIROSHI IWAI
.
Language
English
Journal/Book name
Japanese:
English:
Volume, Number, Page
Published date
June 2010
Publisher
Japanese:
English:
Conference name
Japanese:
English:
2010 Symposium on VLSI Technology
Conference site
Japanese:
English:
Honolulu, USA
©2007
Tokyo Institute of Technology All rights reserved.