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Title
Japanese: 
English:Parallel integration and characterization of nanoscaled epitaxial lattices by concurrent molecular layer epitaxy and diffractometry 
Author
Japanese: 大西 剛, 小宮山 大補, 鯉田 崇, 大橋 智, Stauter Cristian, 鯉沼 秀臣, 大友 明, リップマー ミック, 中川 直之, 川崎 雅司, 菊池 哲夫, 表 和彦.  
English: T. Ohnishi, D. Komiyama, T. Koida, S. Ohashi, C. Stauter, H. Koinuma, A. Ohtomo, M. Lippmaa, N. Nakagawa, M. Kawasaki, T. Kikuchi, K. Omote.  
Language English 
Journal/Book name
Japanese: 
English:Applied Physics Letters 
Volume, Number, Page Vol. 79    No. 4    pp. 536-538
Published date July 2001 
Publisher
Japanese: 
English: 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
File
Official URL <Go to ISI>://000169868100030
 
DOI https://doi.org/10.1063/1.1385587
Abstract A material highway for building up crystal lattices and heterojunctions from molecular layers has been developed based on a concept of combinatorial lattice integration. The atomic-scale precision of automated multilane paving of multilayered thin films is in situ monitored by concurrent reflection high-energy electron diffraction. The designed nanolayered structures are rapidly verified by a concurrent x-ray diffractometer which has been developed for the purpose of this technology. This scheme corresponds to the concurrent two-dimensional Merrifield synthesis to form a variety of sequence-controlled layer structures in parallel and should be widely applicable for systematic fabrication and property screening of nanostructured materials and devices.

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