Concurrent x-ray diffractometer for high throughput structural diagnosis of epitaxial thin films

M. Ohtani; T. Fukumura; M. Kawasaki; K. Omote; T. Kikuchi; J. Harada; A. Ohtomo; M. Lippmaa; T. Ohnishi; D. Komiyama; R. Takahashi; Y. Matsumoto; H. Koinuma

doi:10.1063/1.1415402

Publication Information

Title

Japanese:
English:	Concurrent x-ray diffractometer for high throughput structural diagnosis of epitaxial thin films

Author

Language

English

Journal/Book name

Japanese:
English:	Applied Physics Letters

Volume, Number, Page

Vol. 79 No. 22 pp. 3594-3596

Published date

Nov. 2001

Publisher

Japanese:
English:

Conference name

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English:

Conference site

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English:

File

Official URL

<Go to ISI>://000172204400012

DOI

https://doi.org/10.1063/1.1415402

Abstract

We have developed a concurrent x-ray diffractometer that concurrently measures spatially resolved x-ray diffraction (XRD) spectra of epitaxial thin films integrated on a substrate. A convergent x-ray is focused into stripe on a substrate and the diffracted beam is detected with a two-dimensional x-ray detector. The obtained snapshot image represents a mapping of XRD intensity with the axes of the diffraction angle and the position in the sample. In addition to the parallel XRD measurements of thin films with various compositions and structures, two-dimensional spatial mapping of XRD peak with a resolution of similar to 100 mum is demonstrated. This technique will provide us a high throughput characterization method of various devices composed of epitaxial films.

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