Home >

news Help

Publication Information


Title
Japanese: 
English:High-throughput x-ray diffractometer for combinatorial epitaxial thin films 
Author
Japanese: 大谷 亮, 福村 知昭, 大友 明, 菊池 哲夫, 表 和彦, 鯉沼 秀臣, 川崎 雅司.  
English: M. Ohtani, T. Fukumura, A. Ohtomo, T. Kikuchi, K. Omote, H. Koinuma, M. Kawasaki.  
Language English 
Journal/Book name
Japanese: 
English:Materials Research Society Symposium Proceedings (edited by I. Takeuchi, J. M. Newsam, L. T. Wille, H. Koinuma and E. J. Amis) 
Volume, Number, Page Vol. 700        pp. 125-130
Published date Jan. 2002 
Publisher
Japanese: 
English: 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
Abstract We report on the development of a high throughput x-ray diffractometer (XRD) that concurrently measures spatially resolved x-ray diffraction (XRD) spectra of epitaxial thin films integrated on a substrate. A convergent x-ray is focused into a stripe on a substrate and the diffracted beam is detected with a two-dimensional x-ray detector, so that the snapshot image represents a mapping of XRD intensity with the axes of the diffraction angle and the position in the sample. High throughput characterization of crystalline structure is carried out for a BaxSr1-xTiO3 composition-spread film on a SrTiO3 substrate. Not only the continuous spread of the composition (x), but also the continuous spread of the growth temperature (T) are given to the film by employing a special heating method. The boundary between the strained lattice and relaxed lattice is visualized by the concurrent XRD as function of x and T in a high throughput fashion.

©2007 Tokyo Institute of Technology All rights reserved.