Xe-based Z-pinch gas jet type DPP EUV source for lithography

Publication Information

Title

Japanese:	Xeガスジェット型Zピンチプラズマを用いた半導体リソグラフィ用EUV光源に関する研究
English:	Xe-based Z-pinch gas jet type DPP EUV source for lithography

Author

Japanese:	黄斌, 滝本泰大, 渡邊正人, 堀田栄喜.
English:	Bin Huang, Yasuhiro Takimoto, Masato Watanabe, Eiki Hotta.

Language

English

Journal/Book name

Japanese:	電気学会研究会資料プラズマ・パルスパワー合同研究会
English:	The Papaers of Joint Technical Meeting on Plasma Science and Pulsed Power Technology

Volume, Number, Page

PST-10-034, PPT-10-055

Published date

Aug. 2010

Publisher

Japanese:	電気学会
English:	IEEJ

Conference name

Japanese:	プラズマ・パルスパワー合同研究会
English:	Joint Technical Meeting on Plasma Science and Pulsed Power Technology

Conference site

Japanese:	ホノルル
English:	Honolulu, Hawaii, USA