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Publication Information
Title
Japanese:
English:
Optimized Oxygen Annealing Process for Vth Tuning of p-MOSFET with High-k/Metal Gate Stacks
Author
Japanese:
川那子高暢
,
李映勲
,
角嶋邦之
,
パールハットアヘメト
,
筒井一生
,
西山彰
,
杉井信之
,
名取研二
,
服部健雄
,
岩井洋
.
English:
Takamasa Kawanago
,
Yeonghun Lee
,
Kuniyuki KAKUSHIMA
,
Ahmet Parhat
,
KAZUO TSUTSUI
,
西山彰
,
Nobuyuki Sugii
,
KENJI NATORI
,
takeo hattori
,
HIROSHI IWAI
.
Language
English
Journal/Book name
Japanese:
English:
Volume, Number, Page
Published date
Sept. 2010
Publisher
Japanese:
English:
Conference name
Japanese:
English:
ESSDERC 2010, 40th European Solid-State Device Research Conference
Conference site
Japanese:
English:
Seville, Spain
©2007
Tokyo Institute of Technology All rights reserved.