Xe-based Gas Jet Type Z-pinch Discharge Produced Plasma (DPP) EUV Source for Lithography

Publication Information

Title

Japanese:
English:	Xe-based Gas Jet Type Z-pinch Discharge Produced Plasma (DPP) EUV Source for Lithography

Author

Japanese:	Huang Bin, 滝本泰大, 渡邊正人, 堀田栄喜.
English:	B. Huang, Y. Takimoto, M. Watanabe, E. Hotta.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

12D-11-1

Published date

Nov. 2010

Publisher

Japanese:
English:

Conference name

Japanese:
English:	23rd International Microprocesses and Nanotechnology Conference

Conference site

Japanese:
English:	Fukuoka, Japan