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Title
Japanese: 
English:Preparation of an epitaxy-ready surface of a ZnO(0001) substrate 
Author
Japanese: 赤坂 俊輔, 中原 健, 湯地 洋行, 塚崎 敦, 大友 明, 川崎 雅司.  
English: S. Akasaka, K. Nakahara, H. Yuji, A. Tsukazaki, A. Ohtomo, M. Kawasaki.  
Language English 
Journal/Book name
Japanese:日本応用物理学会 
English:Applied Physics Express 
Volume, Number, Page Vol. 4    No. 3    035701-1-3
Published date Mar. 2011 
Publisher
Japanese:日本応用物理学会 
English:The Japan Society of Applied Physics 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
Official URL http://apex.jsap.jp/link?APEX/4/035701/
 
DOI https://doi.org/10.1143/APEX.4.035701
Abstract We show that there can be a contamination of silica particles on the surface of chemo-mechanically polished ZnO substrates. Consideration of the base of electrochemistry led us to a hypothesis that the alkaline polishing solution produces a layer of Zn(OH)2 capturing silica particles. In-situ observation of the etching process in an acidic solution by means of an atomic force microscope as well as zeta potential measurements supports this hypothesis and gives a clear guidance to solve the problem. We find that an epitaxy-ready surface can be reproducibly prepared by dipping ZnO substrates in an HCl solution (HCl : H2O ¼ 7 : 200) for 30 s.

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