Simulation of silicon double quantum dots device fabricated by combining lithographical and electrostatical approaches

Publication Information

Title

Japanese:
English:	Simulation of silicon double quantum dots device fabricated by combining lithographical and electrostatical approaches

Author

Japanese:	Sulthoni Muhammad Amin, 小寺哲夫, 内田建, 小田俊理.
English:	Muhammad Amin Sulthoni, Tetsuo Kodera, Ken Uchida, Syunri Oda.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

19a-B-4

Published date

Mar. 2010

Publisher

Japanese:
English:

Conference name

Japanese:	第57回応用物理学関係連合講演会
English:

Conference site

Japanese:	平塚市
English: