Pressure and resist thickness dependency of resist time evolutions profiles in nanoimprint lithography

Publication Information

Title

Japanese:
English:	Pressure and resist thickness dependency of resist time evolutions profiles in nanoimprint lithography

Author

Japanese:	Y. Hirai, 大西有希, T. Tanabe, M. Shibata, T. Iwasaki, Y. Iriye.
English:	Y. Hirai, Y. Onishi, T. Tanabe, M. Shibata, T. Iwasaki, Y. Iriye.

Language

English

Journal/Book name

Japanese:
English:	Microelectronic Engineering

Volume, Number, Page

Vol. 85 No. 5 pp. 842–845

Published date

2008

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

Official URL