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Publication Information
Title
Japanese:
English:
Effect of wafer pre-cleaning and plasma irradiation to wafer surfaces for plasma-assisted surface activated bonding
Author
Japanese:
武井 亮平
,
吉田 幸平
,
水本 哲弥
.
English:
R. Takei
,
K. Yoshida
,
T. Mizumoto
.
Language
English
Journal/Book name
Japanese:
English:
Japanese Journal of Applied Physics
Volume, Number, Page
vol. 49 no. 8
Published date
Aug. 10, 2010
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
©2007
Tokyo Institute of Technology All rights reserved.