EUV and SXR Sources Based on Discharge Produced Plasma

Publication Information

Title

Japanese:
English:	EUV and SXR Sources Based on Discharge Produced Plasma

Author

Japanese:	堀田栄喜, 酒井雄祐, ｽﾞｷｭｼ, Huang Bin, 熊井英章, 渡邊正人.
English:	Eiki Hotta, Yusuke Sakai, Qiushi Zhu, Bin Huang, Hideaki Kumai, Masato Watanabe.

Language

English

Journal/Book name

Japanese:
English:	2011 International Academic Symposium on Optoeletcronics and Microelectronics Technology (IASOMT 2011)

Volume, Number, Page

pp. 4-7

Published date

Dec. 28, 2011

Publisher

Japanese:
English:	IEEE

Conference name

Japanese:
English:	2011 International Academic Symposium on Optoeletcronics and Microelectronics Technology (IASOMT 2011)

Conference site

Japanese:
English:	Harbin

DOI