Fabrication of Ni/Al<sub>2</sub>O<sub>3</sub>/Ni Heteroepitaxial Junction by Post Hydrogen Reduction of NiO/Al2O3/NiO Tri-layered Epitaxial Thin Film

Publication Information

Title

Japanese:
English:	Fabrication of Ni/Al₂O₃/Ni Heteroepitaxial Junction by Post Hydrogen Reduction of NiO/Al2O3/NiO Tri-layered Epitaxial Thin Film

Author

Japanese:	山内涼輔, Keisuke Kobayashi, 保坂誠, Toshimasa Suzuki, 小山浩司, 松田晃史, 荒井秀樹, 加藤侑志, Masahiko Mitsuhashi, 金子智.
English:	Ryosuke Yamauchi, Keisuke Kobayashi, Makoto Hosaka, Toshimasa Suzuki, Koji Koyama, Akifumi Matsuda, Hideki Arai, Yushi Kato, Masahiko Mitsuhashi, Satoru Kaneko.

Language

English

Journal/Book name

Japanese:
English:	Japanese Journal of Applied Physics

Volume, Number, Page

Vol. 50 098004

Published date

Sept. 20, 2011

Publisher

Japanese:	応用物理学会
English:	The Japan Society of Applied Physics

Conference name

Japanese:
English:

Conference site

Japanese:
English: