Analysis of Amorphous Alumina Thin Film Etching by Phosphate Buffer Using Surface Plasmon Resonance

Publication Information

Title

Japanese:	Analysis of Amorphous Alumina Thin Film Etching by Phosphate Buffer Using Surface Plasmon Resonance
English:	Analysis of Amorphous Alumina Thin Film Etching by Phosphate Buffer Using Surface Plasmon Resonance

Author

Japanese:	Miyuki Konishi, Naoki Gawazawa, Shin-ichi Kishimoto, Shigeo Ohshio, Hiroki Akasaka, Hidetoshi Saitoh.
English:	Miyuki Konishi, Naoki Gawazawa, Shin-ichi Kishimoto, Shigeo Ohshio, Hiroki Akasaka, Hidetoshi Saitoh.

Language

English

Journal/Book name

Japanese:	Japanese Journal of Applied Physics
English:	Japanese Journal of Applied Physics

Volume, Number, Page

Vol. 48 pp. 865021-865024

Published date

2009

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: