Formation and structural analysis of half-metallic Co2FeSi/SiOxNy/Si contacts with radical-oxynitridation-SiOxNy tunnel barrier

Publication Information

Title

Japanese:
English:	Formation and structural analysis of half-metallic Co2FeSi/SiOxNy/Si contacts with radical-oxynitridation-SiOxNy tunnel barrier

Author

Japanese:	高村陽太, 林建吾, 周藤悠介, 菅原聡.
English:	Y. Takamura, K. Hayashi, Y. Shuto, S. Sugahara.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

paper P-40 pp. 127-128

Published date

Oct. 4, 2011

Publisher

Japanese:
English:

Conference name

Japanese:
English:	International Symposium on Advanced Hybrid Nano Devices (IS-AHND) : Prospects by World’s Leading Scientists

Conference site

Japanese:
English:	Tokyo