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Publication Information
Title
Japanese:
English:
Low-barrier ferromagnet source/drain MOSFETs using CoFe/Mg/AlOx/Si depinning contacts
Author
Japanese:
置塩 貴雄
,
高村 陽太
,
菅原 聡
.
English:
T. Okishio
,
Y. Takamura
,
S. Sugahara
.
Language
English
Journal/Book name
Japanese:
English:
Volume, Number, Page
paper P-42 pp. 131-132
Published date
Oct. 4, 2011
Publisher
Japanese:
English:
Conference name
Japanese:
English:
International Symposium on Advanced Hybrid Nano Devices (IS-AHND) : Prospects by World’s Leading Scientists
Conference site
Japanese:
English:
Tokyo
©2007
Institute of Science Tokyo All rights reserved.