Characterization of L21-ordered full-Heusler Co2FeSi1-xAlx alloy thin films formed by silicidation technique employing a silicon-on-insulator substrate

Publication Information

Title

Japanese:
English:	Characterization of L21-ordered full-Heusler Co2FeSi1-xAlx alloy thin films formed by silicidation technique employing a silicon-on-insulator substrate

Author

Japanese:	佐藤充浩, 高村陽太, 菅原聡.
English:	M. Satoh, Y. Takamura, S. Sugahara.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

DD-10 p. 96

Published date

June 22, 2011

Publisher

Japanese:
English:

Conference name

Japanese:
English:	Electronic Materials Conf. (EMC) 2011

Conference site

Japanese:
English:	Santa Barbara, CA