ラジカル酸窒化膜を用いたCFS/SiOxNy/Siトンネル接合の形成と構造評価

Publication Information

Title

Japanese:	ラジカル酸窒化膜を用いたCFS/SiOxNy/Siトンネル接合の形成と構造評価
English:

Author

Japanese:	高村陽太, 林建吾, 影井泰次郎, 周藤悠介, 菅原聡.
English:	Yota Takamura, Kengo Hayashi, Taijiro Kagei, Yusuke Shuto, SATOSHI SUGAHARA.

Language

Japanese

Journal/Book name

Japanese:
English:

Volume, Number, Page

p. 41

Published date

Nov. 28, 2011

Publisher

Japanese:
English:

Conference name

Japanese:	第16回半導体スピン工学の基礎と応用(PASPS-16)
English:

Conference site

Japanese:	目黒
English: