Thermal Transport in Melting and Recrystallization of Amorphous and Polycrystalline Si Thin Films | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	Thermal Transport in Melting and Recrystallization of Amorphous and Polycrystalline Si Thin Films

Author

Japanese:	波多野睦子.
English:	Mutsuko Hatano.

Language

English

Journal/Book name

Japanese:
English:	Applied Physics A69

Volume, Number, Page

295-298

Published date

1999

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

©2007 Tokyo Institute of Technology All rights reserved.