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Title
Japanese:オゾン水によるクロムエッチング技術の開発 
English:Development of Cr Etching with Ozone-water 
Author
Japanese: 羽月竜治, 山本貴富喜.  
English: Ryuji Hatsuki, Takatoki Yamamoto.  
Language Japanese 
Journal/Book name
Japanese: 
English: 
Volume, Number, Page        
Published date Sept. 26, 2011 
Publisher
Japanese: 
English: 
Conference name
Japanese:第3回 マイクロ・ナノ工学シンポジウム 
English: 
Conference site
Japanese:東京 
English: 
Abstract It is developed and experimentally demonstrated the novel method of etching metal with ozone-water. Ozone-water was generated by bubbling ozone gas through pure water by absorption effect. Cr was used as a test metal. We evaluated the fundamental performance of etching speed depend on temperature and concentration of ozone. The best etching rate during tested conditions is 27nm/hours at 55?C. The roughness on the surface of both etched with a conventional Cr etchant and the ozone-water. As a result, the ozone-water etched surface (Ra=0.94±0.19) was much smoother than that with conventional etchant (2.61±0.77). While the etching rate is much slower than conventional etchant, enough practical etching rates with atomically flat surface will meet various applications in nanotechnology

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