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Publication Information
Title
Japanese:
English:
Effect of Postdeposition, Annealing Temperatures on Electrical Characteristics of Molecular-Beam-Deposited HfO2 on n-InAs/InGaAs Metal-Oxide-Semiconductor Capacitors
Author
Japanese:
H.D. Trinh
,
Yueh-Chin Lin
,
H.C. Wang
,
C.H. Chang
,
角嶋邦之
,
岩井洋
,
川那子高暢
,
Y.G. Lin
,
C.M. Chen
,
Y.Y.Wong
,
G.N. Huang
,
M. Hudait
,
E.Y. Chang
.
English:
H.D. Trinh
,
Yueh-Chin Lin
,
H.C. Wang
,
C.H. Chang
,
Kuniyuki KAKUSHIMA
,
HIROSHI IWAI
,
Takamasa Kawanago
,
Y.G. Lin
,
C.M. Chen
,
Y.Y.Wong
,
G.N. Huang
,
M. Hudait
,
E.Y. Chang
.
Language
English
Journal/Book name
Japanese:
English:
Applied Physics Express
Volume, Number, Page
Vol. 5 No. 2 pp. .021104-1-3
Published date
Feb. 2012
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
©2007
Tokyo Institute of Technology All rights reserved.