Japanese
Home
Search
Horizontal Search
Publication Search
( Advanced Search )
Patent Search
( Advanced Search )
Research Highlight Search
( Advanced Search )
Researcher Search
Search by Organization
Support
FAQ
T2R2 User Registration
Doctoral thesis registration
Support/Contact
About T2R2
What's T2R2?
Operation Guidance
Leaflets
About file disclosure
Related Links
Tokyo Tech
STAR Search
NII IR Program
Home
>
Help
Publication Information
Title
Japanese:
English:
Experimental study of electron mobility characterization in direct contact La-silicate/Si structure based nMOSFETs
Author
Japanese:
川那子高暢
,
李映勲
,
角嶋邦之
,
パールハットアヘメト
,
筒井一生
,
西山彰
,
杉井信之
,
名取研二
,
服部健雄
,
岩井洋
.
English:
Takamasa Kawanago
,
Yeonghun Lee
,
Kuniyuki KAKUSHIMA
,
Ahmet Parhat
,
KAZUO TSUTSUI
,
西山彰
,
Nobuyuki Sugii
,
Kenji Natori
,
takeo hattori
,
HIROSHI IWAI
.
Language
English
Journal/Book name
Japanese:
English:
Solid-State Electronics
Volume, Number, Page
Vol. 74 pp. 2-6
Published date
Aug. 2012
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
DOI
https://doi.org/10.1016/j.sse.2012.04.003
©2007
Tokyo Institute of Technology All rights reserved.